硅化铬;硅化铬溅射耙材;硅化铬, 99+% (METALS BASIS);硅化铬溅射耙材, 50.8MM (2.0IN) DIA X 3.18MM (0.125IN) THIC;硅化铬溅射耙材, 50
CHROMIUM SILICIDE;CHROMIUM DISILICIDE;Chromium silicide,(99+% Cr);Chromiumsilicidemeshgraypowder;CHROMIUM SILICIDE, -230 MESH, 99+%;Cr3Sipowder-325mesh;Chromiumsilicide(metalsbasis);Chromium silicide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basis)
